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Pure Strip Sulfuric Acid-Peroxide Piranha Type Etch

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Product Properties – Pure Strip Piranha Etch
Chemical Name Sulfuric Acid–Hydrogen Peroxide Mixture (Piranha Type Etch)
Appearance Clear, colorless to light yellow liquid
Application Photoresist stripping and organic residue removal in semiconductor, photomask, and IC photolithography processes
Advantages – Negligible attack on aluminum and other metals
– Residue-free rinsing
– Extended bath life (5+ days at room temperature)
– Ready to use, no mixing required
Etch Rate ~35 Å/min on aluminum at room temperature
Operating Temperature Room temp or elevated (60–80°C); higher temp increases activity but reduces bath life
Compatibility Minimal attack on aluminum, titanium, tungsten, copper, tantalum silicide, and ITO
Particle Count Very low metal (LM)/particle concentration (ppb) – Learn More
Safety Data Sheet Download SDS
SKU: N/A Category:

Additional information

Size

1 Quart, 1 Gallon, 4×1 Gallon, 5 Gallon, 55 Gallon