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SQ QuickDry Series, Negative Tone Epoxy Photoresist

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Product Properties
Description SQ QuickDry is an epoxy-based negative photoresist tailored for polymeric MEMS, microfluidics, micromachining, and various microelectronic applications. This system is optimized for both thin and thick films up to 200 microns and features a quicker drying solvent system that minimizes processing times, resulting in enhanced throughput.
Lower Pricing SQ is designed to be competitive in the market with prices that beat the competition. Better quality for less cost. Contact KemLab or our distributors for more information and pricing.
Superior Raw Materials SQ Series SU-8 epoxy resist uses a superior quality resin specially designed for the microelectronics industry. This superior resin manufacturing process produces a cleaner, more consistent negative epoxy photoresist with fewer particles, more transparency, and fewer microbubbles.
Plug-n-Play SQ resists are fully compatible with established SU-8 lithographic processes. Pull out SU-8 negative epoxy and plug in KemLab SQ.
Application-Focused Quality Control Value-added testing was identified and implemented to benefit specific microfluidic and optical industry requirements.
Better Optical Transparency SQ Series SU-8 resin material is visually cleaner, less yellow, and more transparent, resulting in improved transmission and resistance to oxidative yellowing versus legacy SU-8 products.
Data Sheet Download link

Additional information

Type

SQD2, SQD5, SQD10, SQD25, SQD35, SQD50, SQD75

Size

100ml, 500ml, 1L, 4L/1Gal, 4x4L, Production