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APOL-LO 3200 Series, Hi-Res Negative Lift-off Photoresist

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Product Properties
Description APOL-LO 3200 Series resist is a negative tone advanced photoresist with a lift-off profile for i-Line and broadband applications.
Properties
  • Resolution: Improved resolution
  • Process Latitude: Wider process latitude
  • Film Thickness: Range of 2 – 10+ μm
  • Developer: Designed for use with industry standard developers
  • Customization: Available to adjust Lift-Off Angle and PhotoSpeed
  • Competitors: Competes with AZ® nLOF™ 2020, AZ® nLOF™ 2035, AZ® nLOF™ 2070
Volumes & Customization
  • Sizes available: 100ml sample, 500ml, 1L, 4L
  • Production volumes available (> 20G MTO)
  • Custom thicknesses and formulations are available by request
Data Sheet Download link
SKU: N/A Category:

Additional information

Type

3202, 3204, 3207
Size

100ml, 500ml, 1L, 4L/1Gal, 4x4L