Additional information
| Size | 1L, 4L/1Gal, 4x4L |
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| Product Properties | |
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| Product Name | TMAH 0.26N (Product No. PSC1010-10, PSC1010-40, PSC1010-CS) |
| Description | TMAH 0.26N positive photoresist developer is a high purity formulation of the industry standard 2.38 weight % tetramethyl ammonium hydroxide (TMAH) and 0.261N metal-ion-free developer. It is formulated to meet the microlithographic and process requirements for sub-0.5 µm technology. TMAH 0.26N developer is a non-surfactant material for use in spray and spray-puddle processes. |
| Special Features |
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| Size | 1L, 4L/1Gal, 4x4L |
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