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HARP PMMA e-Beam Series, Positive Photoresist

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Product Properties
Description HARP™ PMMA (polymethyl methacrylate) e-Beam resist is designed for high resolution direct write e-Beam lithography. When combined with HARP-C™ copolymer, the HARP multi-layer system is ideal for T-gate manufacture. HARP™ PMMA has excellent adhesion to a wide variety of substrates, and is used as a protective coating layer for wafer thinning and sacrificial layers.
Applications
  • e-Beam direct write lithography
  • Multi-layer T-gate manufacture
  • X-Ray LIGA
  • Protective Coating for wafer thinning
Solvents KemLab HARP™ PMMA products are manufactured in safe solvents (anisole and ethyl lactate).
Volumes & Customization
  • Resist sizes available: 100ml, 500ml, 1L, 4L
  • Developer sizes available: 4L, 4x4L (Case)
  • Custom dilutions are available upon request
Comparison of High-Resolution e-Beam Resists
  • (a) 1000 HARP eB: Highest molecular weight (Mw) PMMA polymer, best resolution and contrast PMMA, manufactured in Anisole, competes with 950 PMMA.
  • (b) 500 HARP eB: PMMA Polymer with mid-range Mw, faster throughput versus 1000 HARP eB, manufactured in Anisole, competes with 495 PMMA.
  • (c) HARP-C: MMA/MAA (methyl methacrylate/methacrylic acid) copolymer, used in multi-layer process with PMMA, manufactured in Ethyl Lactate, competes with MMA(8.5)MAA.
Data Sheet Download link
SKU: N/A Category:

Additional information

eB Series

1000, 500, HARP-C
Type

eB 0.1, eB 0.2, eB 0.3, eB 0.4, eB 0.7, eB 1.3, eB 1.7, eB 2.7, eB 0.07, eB 0.15, eB 0.2, eB 0.3, eB 0.4, eB 0.7, eB 1.5, C0.2, C0.4, C0.5, C0.7, C0.8
Size

100ml, 500ml, 1L, 4L/1Gal, 4x4L, Production